Transport studies of the electrical,...
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  • Transport studies of the electrical, magnetic and thermoelectric properties of topological insulator thin films[electronic resource] /
  • 紀錄類型: 書目-語言資料,印刷品 : Monograph/item
    杜威分類號: 621.31937
    書名/作者: Transport studies of the electrical, magnetic and thermoelectric properties of topological insulator thin films/ by Jinsong Zhang.
    作者: Zhang, Jinsong.
    出版者: Berlin, Heidelberg : : Springer Berlin Heidelberg :, 2016.
    面頁冊數: xvi, 116 p. : : ill. (some col.), digital ;; 24 cm.
    Contained By: Springer eBooks
    標題: Electric insulators and insulation - Thin films.
    標題: Physics.
    標題: Condensed Matter Physics.
    標題: Surfaces and Interfaces, Thin Films.
    ISBN: 9783662499276
    ISBN: 9783662499252
    內容註: Introduction -- Experimental setup and methods -- Band structure engineering in TIs -- Topology-driven magnetic quantum phase transition -- Quantum anomalous Hall effect -- Dichotomy between electrical and thermoelectric properties -- Concluding remarks -- References -- Acknowledgement -- Appendix A -- Appendix B -- Publications.
    摘要、提要註: This book presents the transport studies of topological insulator thin films grown by molecular beam epitaxy. Through band structure engineering, the ideal topological insulators, (Bi1−xSbx)2Te3 ternary alloys, are successfully fabricated, which possess truly insulating bulk and tunable conducting surface states. Further transport measurements on these ternary alloys reveal a disentanglement between the magnetoelectric and thermoelectric properties. In magnetically doped topological insulators, the fascinating quantum anomalous Hall effect was experimentally observed for the first time. Moreover, the topology-driven magnetic quantum phase transition was Systematically controlled by varying the strength of the spin-orbital coupling. Readers will not only benefit from the description of the technique of transport measurements, but will also be inspired by the understanding of topological insulators.
    電子資源: http://dx.doi.org/10.1007/978-3-662-49927-6
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