Compact models and performance inves...
Chandel, Rajeevan.

 

  • Compact models and performance investigations for subthreshold interconnects[electronic resource] /
  • 紀錄類型: 書目-語言資料,印刷品 : Monograph/item
    杜威分類號: 621.3815
    書名/作者: Compact models and performance investigations for subthreshold interconnects/ by Rohit Dhiman, Rajeevan Chandel.
    作者: Dhiman, Rohit.
    其他作者: Chandel, Rajeevan.
    出版者: New Delhi : : Springer India :, 2015.
    面頁冊數: xiii, 113 p. : : ill., digital ;; 24 cm.
    Contained By: Springer eBooks
    標題: Interconnects (Integrated circuit technology) - Design.
    標題: Integrated circuits - Very large scale integration
    標題: Engineering.
    標題: Circuits and Systems.
    標題: Electronics and Microelectronics, Instrumentation.
    標題: Power Electronics, Electrical Machines and Networks.
    標題: Signal, Image and Speech Processing.
    ISBN: 9788132221326 (electronic bk.)
    ISBN: 9788132221319 (paper)
    內容註: Introduction -- Design Challenges in Sub-threshold Interconnect Circuits -- Sub-threshold Interconnect Circuit Design -- Characterization of Dynamic Crosstalk Effect In Sub-threshold Interconnects -- Sub-threshold Interconnect Noise Analysis -- Variability in Sub-threshold Interconnects.
    摘要、提要註: Compact Models and Performance Investigations for Sub-threshold Interconnects provides a detailed analysis of issues related to sub-threshold interconnect performance from the perspective of analytical approach and design techniques. Particular emphasis is laid on the performance analysis of coupling noise and variability issues in sub-threshold domain to develop efficient compact models. The proposed analytical approach gives physical insight of the parameters affecting the transient behavior of coupled interconnects. Remedial design techniques are also suggested to mitigate the effect of coupling noise. The effects of wire width, spacing between the wires, wire length are thoroughly investigated. In addition, the effect of parameters like driver strength on peak coupling noise has also been analyzed. Process, voltage and temperature variations are prominent factors affecting sub-threshold design and have also been investigated. The process variability analysis has been carried out using parametric analysis, process corner analysis and Monte Carlo technique. The book also provides a qualitative summary of the work reported in the literature by various researchers in the design of digital sub-threshold circuits. This book should be of interest for researchers and graduate students with deeper insights into sub-threshold interconnect models in particular. In this sense, this book will best fit as a text book and/or a reference book for students who are initiated in the area of research and advanced courses in nanotechnology, interconnect design and modeling.
    電子資源: http://dx.doi.org/10.1007/978-81-322-2132-6
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