語系:
繁體中文
English
日文
簡体中文
說明(常見問題)
登入
回首頁
切換:
標籤
|
MARC模式
|
ISBD
New perspectives on surface passivat...
~
Black, Lachlan E.
New perspectives on surface passivation[electronic resource] :understanding the Si-Al2O3 interface /
紀錄類型:
書目-語言資料,印刷品 : Monograph/item
杜威分類號:
541.33
書名/作者:
New perspectives on surface passivation : understanding the Si-Al2O3 interface // by Lachlan E. Black.
作者:
Black, Lachlan E.
出版者:
Cham : : Springer International Publishing :, 2016.
面頁冊數:
xxviii, 204 p. : : ill. (some col.), digital ;; 24 cm.
Contained By:
Springer eBooks
標題:
Interfaces (Physical sciences)
標題:
Engineering.
標題:
Power Electronics, Electrical Machines and Networks.
標題:
Surfaces and Interfaces, Thin Films.
標題:
Energy Technology.
ISBN:
9783319325217
ISBN:
9783319325200
內容註:
Introduction -- Surface Recombination Theory -- Al2O3 Deposition and Characterisation -- Electrical Properties of the Si..Al2O3 Interface -- Influence of Deposition Parameters -- Effect of Post-Deposition Thermal Processing- Effect of Surface Dopant Concentration -- Effect of Surface Orientation and Morphology -- Relationship Between Al2O3 Bulk and Interface Properties -- Conclusion.
摘要、提要註:
The book addresses the problem of passivation at the surface of crystalline silicon solar cells. More specifically, it reports on a high-throughput, industrially compatible deposition method for Al2O3, enabling its application to commercial solar cells. One of the main focus is on the analysis of the physics of Al2O3 as a passivating dielectric for silicon surfaces. This is accomplished through a comprehensive study, which moves from the particular, the case of aluminium oxide on silicon, to the general, the physics of surface recombination, and is able to connect theory with practice, highlighting relevant commercial applications.
電子資源:
http://dx.doi.org/10.1007/978-3-319-32521-7
New perspectives on surface passivation[electronic resource] :understanding the Si-Al2O3 interface /
Black, Lachlan E.
New perspectives on surface passivation
understanding the Si-Al2O3 interface /[electronic resource] :by Lachlan E. Black. - Cham :Springer International Publishing :2016. - xxviii, 204 p. :ill. (some col.), digital ;24 cm. - Springer theses,2190-5053. - Springer theses..
Introduction -- Surface Recombination Theory -- Al2O3 Deposition and Characterisation -- Electrical Properties of the Si..Al2O3 Interface -- Influence of Deposition Parameters -- Effect of Post-Deposition Thermal Processing- Effect of Surface Dopant Concentration -- Effect of Surface Orientation and Morphology -- Relationship Between Al2O3 Bulk and Interface Properties -- Conclusion.
The book addresses the problem of passivation at the surface of crystalline silicon solar cells. More specifically, it reports on a high-throughput, industrially compatible deposition method for Al2O3, enabling its application to commercial solar cells. One of the main focus is on the analysis of the physics of Al2O3 as a passivating dielectric for silicon surfaces. This is accomplished through a comprehensive study, which moves from the particular, the case of aluminium oxide on silicon, to the general, the physics of surface recombination, and is able to connect theory with practice, highlighting relevant commercial applications.
ISBN: 9783319325217
Standard No.: 10.1007/978-3-319-32521-7doiSubjects--Topical Terms:
418272
Interfaces (Physical sciences)
LC Class. No.: QC173.4.I57
Dewey Class. No.: 541.33
New perspectives on surface passivation[electronic resource] :understanding the Si-Al2O3 interface /
LDR
:02068nam a2200337 a 4500
001
447299
003
DE-He213
005
20161013114115.0
006
m d
007
cr nn 008maaau
008
161201s2016 gw s 0 eng d
020
$a
9783319325217
$q
(electronic bk.)
020
$a
9783319325200
$q
(paper)
024
7
$a
10.1007/978-3-319-32521-7
$2
doi
035
$a
978-3-319-32521-7
040
$a
GP
$c
GP
041
0
$a
eng
050
4
$a
QC173.4.I57
072
7
$a
THRD
$2
bicssc
072
7
$a
THRM
$2
bicssc
072
7
$a
TEC046000
$2
bisacsh
082
0 4
$a
541.33
$2
23
090
$a
QC173.4.I57
$b
B627 2016
100
1
$a
Black, Lachlan E.
$3
640802
245
1 0
$a
New perspectives on surface passivation
$h
[electronic resource] :
$b
understanding the Si-Al2O3 interface /
$c
by Lachlan E. Black.
260
$a
Cham :
$b
Springer International Publishing :
$b
Imprint: Springer,
$c
2016.
300
$a
xxviii, 204 p. :
$b
ill. (some col.), digital ;
$c
24 cm.
490
1
$a
Springer theses,
$x
2190-5053
505
0
$a
Introduction -- Surface Recombination Theory -- Al2O3 Deposition and Characterisation -- Electrical Properties of the Si..Al2O3 Interface -- Influence of Deposition Parameters -- Effect of Post-Deposition Thermal Processing- Effect of Surface Dopant Concentration -- Effect of Surface Orientation and Morphology -- Relationship Between Al2O3 Bulk and Interface Properties -- Conclusion.
520
$a
The book addresses the problem of passivation at the surface of crystalline silicon solar cells. More specifically, it reports on a high-throughput, industrially compatible deposition method for Al2O3, enabling its application to commercial solar cells. One of the main focus is on the analysis of the physics of Al2O3 as a passivating dielectric for silicon surfaces. This is accomplished through a comprehensive study, which moves from the particular, the case of aluminium oxide on silicon, to the general, the physics of surface recombination, and is able to connect theory with practice, highlighting relevant commercial applications.
650
0
$a
Interfaces (Physical sciences)
$3
418272
650
1 4
$a
Engineering.
$3
372756
650
2 4
$a
Power Electronics, Electrical Machines and Networks.
$3
464716
650
2 4
$a
Surfaces and Interfaces, Thin Films.
$3
464519
650
2 4
$a
Energy Technology.
$3
463819
710
2
$a
SpringerLink (Online service)
$3
463450
773
0
$t
Springer eBooks
830
0
$a
Springer theses.
$3
463746
856
4 0
$u
http://dx.doi.org/10.1007/978-3-319-32521-7
950
$a
Engineering (Springer-11647)
筆 0 讀者評論
多媒體
多媒體檔案
http://dx.doi.org/10.1007/978-3-319-32521-7
評論
新增評論
分享你的心得
Export
取書館別
處理中
...
變更密碼
登入