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Design for manufacturability with advanced lithography[electronic resource] /

紀錄類型:	書目-語言資料,印刷品 : Monograph/item
杜威分類號:	621.3815
書名/作者:	Design for manufacturability with advanced lithography/ by Bei Yu, David Z. Pan.
作者:	Yu, Bei.
其他作者:	Pan, David Z.
出版者:	Cham : : Springer International Publishing :, 2016.
面頁冊數:	xi, 164 p. : : ill., digital ;; 24 cm.
Contained By:	Springer eBooks
標題:	Integrated circuits - Design and construction.
標題:	Photoresists.
標題:	Lithography.
標題:	Engineering.
標題:	Circuits and Systems.
標題:	Processor Architectures.
標題:	Electronics and Microelectronics, Instrumentation.
ISBN:	9783319203850
ISBN:	9783319203843
內容註:	Introduction -- Layout Decomposition for Triple Patterning -- Layout Decomposition for Other Patterning Techniques -- Standard Cell Compliance and Placement Co-Optimization -- Design for Manufacturability with E-Beam Lithography -- Conclusions and Future Works.
摘要、提要註:	This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL) The authors describe in detail a set of algorithms/methodologies to resolve issues in modern design for manufacturability problems with advanced lithography. Unlike books that discuss DFM from the product level, or physical manufacturing level, this book describes DFM solutions from a circuit design level, such that most of the critical problems can be formulated and solved through combinatorial algorithms. Enables readers to tackle the challenge of layout decompositions for different patterning techniques; Presents a coherent framework, including standard cell compliance and detailed placement, to enable Triple Patterning Lithography (TPL) friendly design; Includes coverage of the design for manufacturability with E-Beam lithography.
電子資源:	http://dx.doi.org/10.1007/978-3-319-20385-0

Design for manufacturability with advanced lithography[electronic resource] /
Yu, Bei.

Design for manufacturability with advanced lithography[electronic resource] /by Bei Yu, David Z. Pan. - Cham :Springer International Publishing :2016. - xi, 164 p. :ill., digital ;24 cm.

Introduction -- Layout Decomposition for Triple Patterning -- Layout Decomposition for Other Patterning Techniques -- Standard Cell Compliance and Placement Co-Optimization -- Design for Manufacturability with E-Beam Lithography -- Conclusions and Future Works.

This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL) The authors describe in detail a set of algorithms/methodologies to resolve issues in modern design for manufacturability problems with advanced lithography. Unlike books that discuss DFM from the product level, or physical manufacturing level, this book describes DFM solutions from a circuit design level, such that most of the critical problems can be formulated and solved through combinatorial algorithms. Enables readers to tackle the challenge of layout decompositions for different patterning techniques; Presents a coherent framework, including standard cell compliance and detailed placement, to enable Triple Patterning Lithography (TPL) friendly design; Includes coverage of the design for manufacturability with E-Beam lithography.

ISBN: 9783319203850

Standard No.: 10.1007/978-3-319-20385-0doiSubjects--Topical Terms:

343137
Integrated circuits
--Design and construction.

LC Class. No.: TK7874

Dewey Class. No.: 621.3815

Design for manufacturability with advanced lithography[electronic resource] /
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