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Nano-CMOS gate dielectric engineerin...

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Wong, Hei.

Nano-CMOS gate dielectric engineering[electronic resource] /

レコード種別:	言語・文字資料 (印刷物) : 単行資料
[NT 15000414] null:	621.3815/28
タイトル / 著者:	Nano-CMOS gate dielectric engineering/ Hei Wong.
著者:	Wong, Hei.
出版された:	Boca Raton, FL : : CRC Press,, ©2011.
記述:	1 online resource (xiv, 234 p.) : : ill.
主題:	Metal oxide semiconductors, Complementary - Design and construction.
主題:	Dielectrics.
主題:	Gate array circuits.
主題:	Nanoelectronics - Materials.
国際標準図書番号 (ISBN) :	1439849609 (electronic bk.)
国際標準図書番号 (ISBN) :	9781439849606 (electronic bk.)
[NT 15000227] null:	Includes bibliographical references and index.
[NT 15000228] null:	1. Overview of CMOS technology -- 2. High-k dielectrics -- 3. Complex forms of high-k oxides -- 4. Dielectric interfaces -- 5. Impacts on device operation -- 6. Fabrication issues -- 7. Conclusions.
電子資源:	http://www.crcnetbase.com/doi/book/10.1201/b11270

Nano-CMOS gate dielectric engineering[electronic resource] /
Wong, Hei.

Nano-CMOS gate dielectric engineering[electronic resource] /Hei Wong. - Boca Raton, FL :CRC Press,©2011. - 1 online resource (xiv, 234 p.) :ill.

Includes bibliographical references and index.

1. Overview of CMOS technology -- 2. High-k dielectrics -- 3. Complex forms of high-k oxides -- 4. Dielectric interfaces -- 5. Impacts on device operation -- 6. Fabrication issues -- 7. Conclusions.

ISBN: 1439849609 (electronic bk.)Subjects--Topical Terms:

418300
Metal oxide semiconductors, Complementary
--Design and construction.

LC Class. No.: TK7871.99.M44 / W66 2011

Dewey Class. No.: 621.3815/28

Nano-CMOS gate dielectric engineering[electronic resource] /
LDR:01136cam a2200265Ma 4500 001 415798
003 OCoLC
005 20141031092916.0
006 m o d
007 cr |n|||||||||
008 150203s2011 flua ob 001 0 eng d
020 $a 1439849609 (electronic bk.)
020 $a 9781439849606 (electronic bk.)
020 $z 9781439849590 (hardcover : alk. paper)
020 $z 1439849595 (hardcover : alk. paper)
035 $a (OCoLC)768572191
035 $a ocn768572191
040 $a YDXCP $b eng $e pn $c YDXCP $d E7B $d UIU $d OTZ $d DEBSZ $d OCLCQ $d OCLCO $d CRCPR $d OCLCQ
050 4 $a TK7871.99.M44 $b W66 2011
082 0 4 $a 621.3815/28 $2 23
100 1 $a Wong, Hei. $3 587114
245 1 0 $a Nano-CMOS gate dielectric engineering $h [electronic resource] / $c Hei Wong.
260 $a Boca Raton, FL : $b CRC Press, $c ©2011.
300 $a 1 online resource (xiv, 234 p.) : $b ill.
504 $a Includes bibliographical references and index.
505 0 $a 1. Overview of CMOS technology -- 2. High-k dielectrics -- 3. Complex forms of high-k oxides -- 4. Dielectric interfaces -- 5. Impacts on device operation -- 6. Fabrication issues -- 7. Conclusions.
650 0 $a Metal oxide semiconductors, Complementary $x Design and construction. $3 418300
650 0 $a Dielectrics. $3 553786
650 0 $a Gate array circuits. $3 587115
650 0 $a Nanoelectronics $x Materials. $3 469140
856 4 0 $u http://www.crcnetbase.com/doi/book/10.1201/b11270

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