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Handbook of plasma processing techno...

CuomoJerome J. editor

Handbook of plasma processing technology:fundamentals,etching,deposition,and surface interactions

紀錄類型:	書目-語言資料,印刷品 : Monograph/item
書名/作者:	Handbook of plasma processing technology:fundamentals,etching,deposition,and surface interactions/ Cuomo,Jerome J. editor;Rossnagel,Stephen M. editor;Westwood,William D.,1937-
作者:	CuomoJerome J. editor
其他作者:	RossnagelStephen M. editor
出版者:	New Jersey : Noyes Publications, 1996
面頁冊數:	523頁; 24x16公分
標題:	Plasma engineering
標題:	Semiconductors-Etching
標題:	Plasma etching
ISBN:	0815512201(精裝)

Handbook of plasma processing technology:fundamentals,etching,deposition,and surface interactions
CuomoJerome J. editor

Handbook of plasma processing technology:fundamentals,etching,deposition,and surface interactionsCuomo,Jerome J. editor;Rossnagel,Stephen M. editor;Westwood,William D.,1937- - New JerseyNoyes Publications1996 - 523頁24x16公分

ISBN: 0815512201(精裝)Subjects--Topical Terms:

153779
Plasma engineering

Handbook of plasma processing technology:fundamentals,etching,deposition,and surface interactions
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