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Variation-aware advanced CMOS devices and SRAM[electronic resource] /

紀錄類型:	書目-電子資源 : Monograph/item
杜威分類號:	621.384134
書名/作者:	Variation-aware advanced CMOS devices and SRAM/ by Changhwan Shin.
作者:	Shin, Changhwan.
出版者:	Dordrecht : : Springer Netherlands :, 2016.
面頁冊數:	vii, 140 p. : : ill., digital ;; 24 cm.
Contained By:	Springer eBooks
標題:	Metal oxide semiconductors, Complementary.
標題:	Random access memory.
標題:	Physics.
標題:	Electronic Circuits and Devices.
標題:	Circuits and Systems.
標題:	Semiconductors.
標題:	Electronics and Microelectronics, Instrumentation.
ISBN:	9789401775977
ISBN:	9789401775953
內容註:	1 Introduction and Overview -- 2 Understanding of Process-Induced Random Variation -- 3 Various Variation-Robust CMOS Device Designs -- 4 Applications to Static Random Access Memory (SRAM) -- 5 Conclusion.
摘要、提要註:	This book provides a comprehensive overview of contemporary issues in complementary metal-oxide semiconductor (CMOS) device design, describing how to overcome process-induced random variations such as line-edge-roughness, random-dopant-fluctuation, and work-function variation, and the applications of novel CMOS devices to cache memory (or Static Random Access Memory, SRAM) The author places emphasis on the physical understanding of process-induced random variation as well as the introduction of novel CMOS device structures and their application to SRAM. The book outlines the technical predicament facing state-of-the-art CMOS technology development, due to the effect of ever-increasing process-induced random/intrinsic variation in transistor performance at the sub-30-nm technology nodes. Therefore, the physical understanding of process-induced random/intrinsic variations and the technical solutions to address these issues plays a key role in new CMOS technology development. This book aims to provide the reader with a deep understanding of the major random variation sources, and the characterization of each random variation source. Furthermore, the book presents various CMOS device designs to surmount the random variation in future CMOS technology, emphasizing the applications to SRAM.
電子資源:	http://dx.doi.org/10.1007/978-94-017-7597-7

Variation-aware advanced CMOS devices and SRAM[electronic resource] /
Shin, Changhwan.

Variation-aware advanced CMOS devices and SRAM[electronic resource] /by Changhwan Shin. - Dordrecht :Springer Netherlands :2016. - vii, 140 p. :ill., digital ;24 cm. - Springer series in advanced microelectronics,v.561437-0387 ;. - Springer series in advanced microelectronics ;33..

1 Introduction and Overview -- 2 Understanding of Process-Induced Random Variation -- 3 Various Variation-Robust CMOS Device Designs -- 4 Applications to Static Random Access Memory (SRAM) -- 5 Conclusion.

This book provides a comprehensive overview of contemporary issues in complementary metal-oxide semiconductor (CMOS) device design, describing how to overcome process-induced random variations such as line-edge-roughness, random-dopant-fluctuation, and work-function variation, and the applications of novel CMOS devices to cache memory (or Static Random Access Memory, SRAM) The author places emphasis on the physical understanding of process-induced random variation as well as the introduction of novel CMOS device structures and their application to SRAM. The book outlines the technical predicament facing state-of-the-art CMOS technology development, due to the effect of ever-increasing process-induced random/intrinsic variation in transistor performance at the sub-30-nm technology nodes. Therefore, the physical understanding of process-induced random/intrinsic variations and the technical solutions to address these issues plays a key role in new CMOS technology development. This book aims to provide the reader with a deep understanding of the major random variation sources, and the characterization of each random variation source. Furthermore, the book presents various CMOS device designs to surmount the random variation in future CMOS technology, emphasizing the applications to SRAM.

ISBN: 9789401775977

Standard No.: 10.1007/978-94-017-7597-7doiSubjects--Topical Terms:

418508
Metal oxide semiconductors, Complementary.

LC Class. No.: TK7871.99.M44

Dewey Class. No.: 621.384134

Variation-aware advanced CMOS devices and SRAM[electronic resource] /
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